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Ultranarrow trench-isolated 0.2-/spl mu/m CMOS and its application to ultralow-power frequency dividers

机译:超窄沟槽隔离0.2- / splμ/ m CMOS及其在超低功耗分频器中的应用

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We applied shadow trench isolation to 0.2-/spl mu/m gate-length CMOS to fully utilize its low-power capability. With a proper design of device structure and dopant concentrations, the narrow-channel effect was not conspicuous down to the effective channel width of 0.1 /spl mu/m, and inter-device isolation was secured down to the coded isolation width of 0.28 /spl mu/m. Using the narrow-channel devices, a frequency divider circuit operating with a first-stage power dissipation of 12 fJ per clock has been fabricated.
机译:我们将阴影沟槽隔离应用于0.2- / splμm/ m的栅极长度CMOS,以充分利用其低功耗功能。通过适当设计器件结构和掺杂剂浓度,在有效通道宽度降至0.1 / spl mu / m的情况下,窄通道效应并不明显,并且器件间隔离可确保降至编码隔离宽度0.28 / spl。亩/米使用窄通道器件,已经制造出以每时钟12 fJ的第一级功耗工作的分频器电路。

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