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Preferred crystallographic directions of pore propagation in porous silicon layers

机译:多孔硅层中孔隙传播的优选晶体学方向

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Results are presented that demonstrate that pores propagate along preferred crystallographic directions within both n- and p-type silicon substrates. In addition to this, pores were surprisingly found not to have a round shape. Instead, they are confined by well-defined crystallographic planes. The results from plane-view TEM technique provide quantitative information on the pore size and pore-to-pore distance distributions. These indicate that morphologies are most sensitive to the silicon substrate characteristics.
机译:呈现的结果表明,孔在n型和p型硅衬底内均沿优选的晶体学方向传播。除此之外,令人惊讶地发现孔不具有圆形形状。取而代之的是,它们被定义明确的结晶平面所限制。平面TEM技术的结果提供了有关孔径和孔间距离分布的定量信息。这些表明形态对硅衬底的特性最敏感。

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