Noncontact surface potential measurements for charging reduction during TEOS deposition and ion implantation

机译：非接触表面电势测量，可在TEOS沉积和离子注入过程中减少电荷

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Abstract: In this paper, we investigate the possibility of using non- contact surface potential measurements (SPM) to study charging during plasma enhanced CVD TEOS deposition and high current ion implantation. It is found that SPM can be used for a first order and fast-feedback assessment of new recipes and tools as well as for routine monitoring of plasma damaging processes. !11

机译：摘要：在本文中，我们研究了在等离子体增强CVD TEOS沉积和大电流离子注入过程中使用非接触表面电势测量（SPM）研究充电的可能性。发现SPM可用于新配方和工具的一阶和快速反馈评估以及血浆破坏过程的常规监控。！11

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来源
《In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II》|1998年|p.115-124|共10页
会议地点 Santa Clara CA(US)
作者
Antonio Cacciato; Philips Semiconductors; Nijmegen; Netherlands; Peter Schumbera; Philips Semiconductors; Nijmegen; Netherlands; Arne Heessels; Philips Semiconductors; Nijmegen; Netherlands; Jan R. Luchies; Philips Semiconductors; Nijmegen; Netherlands; M;
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正文语种 eng
中图分类无线电电子学、电信技术;
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1. Non Contact Surface Potential Measurements for Charging Reduction During Manufacturing of Metal-Insulator-Metal Capacitors [J] . J. Ackaert, Z. Wang, E. De Backer Microelectronics & Reliability . 2001,第9a10期

机译：非接触表面电位测量，用于在制造金属-绝缘子-金属电容器时减少充电
2. Reduction of the parasitic charge generation during silicon nitride deposition deposition in a LOCOS isolation without field implant [J] . J.L. Fay, J. Beluch, B. Despax Microelectronics & Reliability . 2000,第4a5期

机译：在没有场注入的情况下，在LOCOS隔离中减少氮化硅沉积过程中的寄生电荷产生
3. Measurements of the Potentials of Zero Free Charge and Zero Total Charge for 1-thio-β-D-glucose and DPTL Modified Au(111) Surface in Different Electrolyte Solutions [J] . Zhangfei Su, Jay Leitch, Jacek Lipkowski Zeitschrift fur Physikalische Chemie: International Journal of Research in Physical Chemistry and Chemical Physics . 2012,第9a10期

机译：1-硫代-β-D-葡萄糖和DPTL修饰的Au（111）表面在不同电解质溶液中的零电荷和零总电荷的电势测量
4. Noncontact surface potential measurements for charging reduction during TEOS deposition and ion implantation [C] . Antonio Cacciato, Peter Schumbera, Arne Heessels, Conference on In-Line characterization techniques for performance and yield enhancement in microelectronic manufacturing . 1998

机译：在TEOS沉积和离子注入期间，非接触表面电位测量用于降低和离子注入
5. A structured light system and its use for noncontact three-dimensional measurement of the human body surface [D] . Keizer, Richard L. 1991

机译：结构化照明系统及其在人体表面非接触式三维测量中的用途
6. Zeta Potential Measurements on Solid Surfaces for in Vitro Biomaterials Testing: Surface Charge Reactivity Upon Contact With Fluids and Protein Absorption [O] . Sara Ferraris, Martina Cazzola, Veronica Peretti, 2018

机译：用于体外生物材料测试的固体表面Zeta电位测量：表面电荷与液体接触时的反应性和蛋白质吸收
7. Zeta Potential Measurements on Solid Surfaces for in Vitro Biomaterials Testing: Surface Charge, Reactivity Upon Contact With Fluids and Protein Absorption [O] . Sara Ferraris, Martina Cazzola, Veronica Peretti, 2018

机译：用于体外生物材料测试的固体表面上的Zeta电位测量：表面电荷，与流体接触后的反应性和蛋白质吸收
8. TEOS-based SiO(sub 2) chemical vapor deposition: Reaction kinetics and related surface chemistry [R] . Bartram, M. E. , Moffat, H. K. 1995

机译：基于TEOs的siO（sub 2）化学气相沉积：反应动力学和相关的表面化学

Noncontact surface potential measurements for charging reduction during TEOS deposition and ion implantation

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