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Density-activated defect recombination as a possible explanation for the efficiency droop in GaN-based diodes

机译:密度激活的缺陷复合可能是GaN基二极管效率下降的可能解释

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摘要

A model based on density-activated defect recombination processes is proposed as a possible explanation for the efficiency droop in GaN-based lasers. The model yields very good agreement with experimentally measured efficiencies based on fit parameters that indicate the presence of two types of recombination centers that have different local distributions and recombination rates. The recombination rates of the two types are found to be very similar for devices operating at 530nm and 410nm.
机译:提出了一种基于密度激活缺陷复合过程的模型,作为GaN基激光器效率下降的可能解释。该模型与基于拟合参数的实验测量效率产生了很好的一致性,拟合参数表明存在两种类型的重组中心,它们具有不同的局部分布和重组率。对于工作在530nm和410nm的器件,发现两种类型的重组率非常相似。

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