Raman spectrometer for in-situ study of diamond growth in DC discharge plasma CVD reactor

摘要

Abstract: A Raman spectrometer designed for the purpose of in-situ diagnostics of materials deposited in a gas discharge plasma under conditions of intense illumination from the discharge and heat radiation from a substrate is described. The characteristic feature of the spectrometer is the use of a pulsed Cu-vapor laser as the excitation source, along with the gated detection of the signal from a photomultiplier tube. The spectrometer is the fully PC-controlled system made on the base of a double grating monomchromator. The operation of the spectrometer is demonstrated in application to the study of processes of growth and modification of polycrystalline diamond films under d.c. discharge conditions. It is shown that in-situ Raman spectroscopy can be used for determination of the phase composition and the thickness of the deposited carbon films, and, also their temperature, internal stress, and changes of these parameters during the film growth. !12