DC power plasma CVD diamond growth apparatus

摘要

The present invention relates to a next-pole DC-powered plasma CVD diamond growth apparatus capable of synthesizing diamonds in a film form using a DC-powered plasma chemical vapor deposition method, which generates plasma to form an internal space for growing diamonds on a substrate. A chamber and a positive electrode part which is installed in the inner space of the plasma chamber to support the substrate, and which is opposite to the positive electrode part and the positive electrode part, which are grounded on one side, are provided with independent DC power supplies. It is formed of a plurality of cathode device combinations connected to, and may include a cathode unit capable of adjusting a separation distance between each cathode of the cathode device combination.