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Laser damage to optical components induced by surface chromium particles

机译:激光对表面铬颗粒引起的光学组件的损害

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To obtain better understanding of particulate contamination, chromium dots (50 x 50 μm~2) were deposited on a silica substrate by photolithography. The aim in using this sample is to observe the mechanism of damage initiation that can be attributed to surface contamination of micro-metric size. A Nd:YAG laser irradiated the sample at 1064 nm for different fluences and also different numbers of shots. Several methods were used to characterise the laser effects on the chromium dots and the silica substrate: "Nomarski", "atomic force" and photothermal microscope observations. The laser fluence is found to be the most important parameter for the behaviour of the chromium dots. At low fluence ( < 1 J/cm~2), they become cracked (fractured). At medium fluence (around 1 J/cm~2) chromium fusion is reached and chromium oxide appears. Finally at higher fluence (3 J/cm~2), although chromium dots are blown off the substrate and small damage to silica occurs on the first shot, the subsequent shots do not lead to a dramatic increase in the damage.
机译:为了更好地理解微粒污染,通过光刻将铬点(50 x 50μm〜2)沉积在二氧化硅基板上。使用该样品的目的是观察引起损伤的机理,其可归因于微米尺寸的表面污染。 Nd:YAG激光在1064 nm处照射样品,以产生不同的注量和不同的拍摄次数。几种方法用于表征激光对铬点和二氧化硅衬底的影响:“诺马尔斯基”,“原子力”和光热显微镜观察。发现激光能量密度是铬点行为的最重要参数。在低通量(<1 J / cm〜2)下,它们会破裂(破裂)。在中等通量(约1 J / cm〜2)下,铬达到熔融并出现氧化铬。最终,在更高的通量下(3 J / cm〜2),尽管铬点从基材上吹了出来,并且在第一次喷丸时对二氧化硅的损害很小,但随后的喷丸并不会导致损伤的急剧增加。

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