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Annealing behaviour of defects in helium implanted MGO

机译:氦气注入MGO中缺陷的退火行为

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摘要

Virgin MgO (110) single crystals have been implanted with 30 keV ~3He~+ ions to a dose of 5X10~15 cm~-2. After implantation the samples have been annealed under air for 30 min in a tube oven. The annealing behaviour of the defects and ~3He has been monitroed by three experimental techniques: positron beam Doppler broadening, neutron depth profiling (NDP) and optical absorption in the UV to near-IR region. The observations in MgO lead to the conclusion that below 1000 deg C the vacancy like defects are stabilised by the implanted He atoms. Above this temperature He may dissociate from these small defects, alowing the formation of larger vacancy clusters. direct c 1999 Elsevier Science B.V. All rights reserved.
机译:已将30 keV〜3He〜+离子注入Virgin MgO(110)单晶,剂量为5X10〜15 cm〜-2。植入后,将样品在管式烘箱中在空气中退火30分钟。缺陷和〜3He的退火行为已通过三种实验技术进行了模拟:正电子束多普勒展宽,中子深度轮廓分析(NDP)以及在紫外至近红外区域的光吸收。在MgO中的观察结果得出的结论是,在1000摄氏度以下,通过注入的He原子可以稳定空位(如缺陷)。在此温度以上,He可能会与这些小缺陷分离,从而导致形成较大的空位簇。直接c 1999 Elsevier Science B.V.保留所有权利。

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