首页> 外文会议>International Symposium for Testing and Failure Analysis(ISTFA 2004); 20051106-10; San Jose,CA(US) >In-line High-Resistance Tungsten Plug Defect Monitoring with an Advanced e-beam System
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In-line High-Resistance Tungsten Plug Defect Monitoring with an Advanced e-beam System

机译:借助先进的电子束系统进行在线高电阻钨塞缺陷监测

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摘要

In-line e-beam inspection is performed to detect dark voltage contrast (DVC) defects on normally bright W-plugs. Cross-sectional SEM and TEM in an FA lab verified that the different gray level values (GLV) of DVC defects are caused by different resistances of the W-plugs. We found that DVC defects with lower GLV (GLV1) are W-plugs that are open and almost open. DVC defects with GLV2 are caused by partially open W-plugs and in-plug voids.
机译:进行在线电子束检查以检测通常明亮的W型插头上的暗电压对比(DVC)缺陷。 FA实验室的横截面SEM和TEM证明DVC缺陷的不同灰度值(GLV)是由W插头的不同电阻引起的。我们发现,GLV(GLV1)较低的DVC缺陷是W插头处于打开状态,几乎是打开的。 GLV2的DVC缺陷是由部分打开的W型插头和插头内空隙引起的。

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