首页> 外文会议>International Symposium for Testing and Failure Analysis(ISTFA 2004); 20051106-10; San Jose,CA(US) >Failure Analysis of Soft Single Column Failure in Advanced Nano SRAM Device with Internal Probing Techniques
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Failure Analysis of Soft Single Column Failure in Advanced Nano SRAM Device with Internal Probing Techniques

机译:采用内部探测技术的先进纳米SRAM装置软单列故障失效分析

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摘要

Single column failure, one of the complex failure modes in SRAM is possibly induced by multiform defect types at diverse locations. Especially, soft single column failure is of great complexity. As physical failure analysis (PFA) is expensive and time-consuming, thorough electrical failure analysis (EFA) is needed to precisely localize the failing area to greater precision before PFA. The methodology involves testing for failure mode validation, understanding the circuit and using EFA tools such as IR-OBIRCH (InfraRed-Optical Beam Induced Resistance CHange) and MCT (MerCad Telluride, HgCdTe) for analysis. However, the electrical failure signature for soft single column failure is usually marginal, so additional techniques are needed to obtain accurate isolation and electrical characterization instead of blindly looking around. Thus in this discussion, we will also present the use of internal probing techniques like C-AFM (Conductive Atomic Force Microscopy) and a nanoprobing technique for characterizing electrical properties and understanding the root cause.
机译:单列故障(SRAM中的复杂故障模式之一)可能是由不同位置的多种形式的缺陷类型引起的。尤其是软单列故障非常复杂。由于物理故障分析(PFA)昂贵且耗时,因此需要彻底的电气故障分析(EFA)才能在PFA之前将故障区域精确定位到更高的精度。该方法包括进行故障模式验证测试,了解电路并使用EFA工具(例如IR-OBIRCH(红外光束感应电阻变化)和MCT(MerCad Telluride,HgCdTe))进行分析。但是,软单列故障的电气故障特征通常是微不足道的,因此需要其他技术来获得准确的隔离和电气特性,而不是盲目环顾四周。因此,在本讨论中,我们还将介绍内部探测技术(例如C-AFM(导电原子力显微镜))和纳米探测技术的使用,以表征电性能并理解根本原因。

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