首页> 外文会议>International Symposium on Pulsed Power and Plasma Applications; 20021022-26; Mianyang(CN) >SURFACE MODIFICATION OF GRAPHITE TARGETS BY INTENSE PULSED ION BEAM IRRADIATION
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SURFACE MODIFICATION OF GRAPHITE TARGETS BY INTENSE PULSED ION BEAM IRRADIATION

机译:强脉冲离子束辐照对石墨靶材的表面改性

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High-density, high-pressure ablation plasma produced by intense pulsed ion beam has been used to modify the graphite target surface. The graphite targets were irradiated by 60 - 100 J/cm2 of ion beam. The behavior of ablation plasma was observed by high-speed photography. The kinetic energy of the carbon atoms in the plasma was estimated to be 14 eV/atom at the 100 J/cm2 of ion beam irradiation. Structure of the irradiated targets was investigated by Raman spectroscopy and X-ray diffractometry. We found that either graphite structure or crystallite size in the targets was changed by the ion beam irradiation.
机译:由强脉冲离子束产生的高密度,高压烧蚀等离子体已用于修饰石墨靶表面。用60-100 J / cm2的离子束照射石墨靶。通过高速摄影观察消融等离子体的行为。在100 J / cm2的离子束辐照下,等离子体中碳原子的动能估计为14 eV /原子。通过拉曼光谱和X射线衍射法研究了被照射靶的结构。我们发现,靶中的石墨结构或微晶尺寸均被离子束辐照改变。

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