DEPOSITION UNIFORMITY OF PULSED VACUUM ARC ION SOURCE

摘要

The principle and technical characteristics of pulsed vacuum arc ion source is introduced, and the diamond-like carbon (DLC) film is deposited with it. A lot of experiments are done with various technical parameters, including main loop voltage, pulse frequency, and substrate height, for finding out the action mechanism on film uniformity. A novel rotary holder was designed, using this holder, the deposition uniformity of pulsed vacuum arc ion source within the range of 160mm is achieved, and within this range, the film thickness relative error is less than ±3%.