PREPARATION OF HARD CARBON FILMS BY MCECR PLASMA SPUTTERING METHOD

摘要

Experimental study to obtain high quality hard carbon films were conducted using a Mirror-Confinement-type Electron Cyclotron Resonance (MCECR) plasma sputtering method. The films with 40nm thickness were deposited onto silicon(100) substrates by sputtering the sintered carbon target with the argon plasma. The bonding structure of the film was analyzed by using the x-ray photoelectron spectropscopy(XPS) and the nanostructure was evaluated with the high-resolution transmission electron microscopy(HRTEM). The effect of argon ion irradiation energy controlled by the substrate bias on the nanostructure and the tribological properties (friction coefficient, wear rate, nanohardness) of the film was investigated. The tribological properties were measured by using a Pin-on-Disk tribometer under the conditions that the normal load was 1N and the sliding velocity was 0.05m/s. The nanohardness of the films was measured by using the triboscope under conditions that the maximum displacement was 30nm and the maximum load was 500μN.