首页> 外文会议>International Conference on Solid-State and Integrated Circuit Technology(ICSICT-2006); 20061023-26; Shanghai(CN) >Electrostatic Discharge Protection in the Nano-Technology - Will We be able to Provide ESD Protection in the Future?
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Electrostatic Discharge Protection in the Nano-Technology - Will We be able to Provide ESD Protection in the Future?

机译:纳米技术中的静电放电保护-我们将来能否提供ESD保护?

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摘要

Electrostatic Discharge (ESD) phenomenon will play a critical role in the introduction, manufacturing and implementation of present day semiconductor devices and future nano-structures [1]. In the future, the ability to produce nanostructures may be limited by the ESD sensitivity of these electronic and mechanical elements. The ESD Technology Roadmap will be shown, highlighting a decreasing ESD robustness with technology scaling. ESD technology scaling issues in advanced CMOS, RF CMOS, silicon germanium, to gallium arsenide will be reviewed. ESD issues from wafer-level charging, on-chip protection, to off-chip protection will be discussed. In addition trends in RF MEMs, FINFETs, magnetic recording, photo-masks to Carbon Nano-tubes (CNT) will be discussed.
机译:静电放电(ESD)现象将在当今的半导体器件和未来的纳米结构的引入,制造和实施中发挥关键作用[1]。将来,产生纳米结构的能力可能会受到这些电子和机械元件的ESD敏感性的限制。将显示ESD技术路线图,突出显示随着技术规模的提高,ESD健壮性不断下降。将审查高级CMOS,RF CMOS,硅锗到砷化镓中的ESD技术缩放问题。将讨论从晶圆级充电,片上保护到片外保护的ESD问题。此外,还将讨论RF MEM,FINFET,磁记录,碳纳米管(CNT)的光掩模的趋势。

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