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Generating Mechanism of the Surface Micro-texture of Magnetic Disc Substrate in Polishing

机译:磁盘基板表面微细纹理抛光的产生机理

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摘要

Generating mechanism of the surface micro-texture of 3.5" magnetic disc substrate with plated NiP layer in polishing is analyzed in detail and the surface micro-texture of primary and polished substrate is observed by SEM. The results shows that (1) the surface roughness of the substrate is constructed by new scratches and primary texture that has been polished; (2) the polishing motion parameters have little effect on surface roughness except polishing grains size and pad material, and (3) surface roughness varies exponentially with polishing time and material removal depth.
机译:详细分析了3.5“抛光NiP镀层磁盘基板表面微观结构的产生机理,并通过SEM观察了一次和抛光基板的表面微观结构。结果表明:(1)表面粗糙度基材的表面由新的划痕和已抛光的原始纹理构成;(2)抛光运动参数对表面粗糙度的影响很小,除了抛光晶粒尺寸和抛光垫材料外,(3)表面粗糙度随抛光时间和材料成指数变化去除深度。

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