Self-Adapting Vertices for Mask-Layout Synthesis

摘要

An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is based on evolutionary algorithms, where the locations of vertices in the polygonal mask-layout are optimized, such that the resulting shape is 'closest' to the desired shape. This work has been extended here to include varying the number of vertices in the mask-layout polygon(s), to free the designer from having to make an initial estimate at the complexity of the mask-layout required. Preliminary results are presented.