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Early Stage of Solid State Interfacial Reaction between Copper and Tin

机译:铜和锡之间的固态界面反应的早期阶段

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摘要

High-purity plates of Cu and Sn were diffusion bonded to clarify the early stage of the solid state interfacial reaction between Cu and Sn, focusing on the incubation time for the formation of intermetallic compounds. A clear incubation time for the formation of intermetallic compounds is observed at every temperature between 423 and 493 K. The incubation time changes depending on the annealing temperature. The interface annealed at 423 K for 3.60 ks maintains the direct interconnection between Cu and Sn being free of intermetallic compounds. The exposure of Cu surface to air affects the interfacial reaction. Annealing of the Cu/Sn interface at 493 K for 3600 s starts to form voids by using the Cu plates exposed for 8.64× 10~4 s or longer to air. Furthermore, the reaction product layer formed by the same annealing condition becomes thinner when the Cu plates exposed for 8.64×10~5 s or longer to air are used.
机译:扩散键合高纯度的铜和锡板,以阐明铜和锡之间的固态界面反应的早期阶段,重点是形成金属间化合物的孵育时间。在423至493 K之间的每个温度下,观察到明显的金属间化合物形成潜伏期。潜伏期随退火温度而变化。在423 K退火3.60 ks的界面保持了Cu和Sn之间没有金属间化合物的直接互连。铜表面暴露于空气会影响界面反应。通过使用暴露于空气中8.64×10〜4 s或更长时间的Cu板,在493 K下将Cu / Sn界面退火3600 s开始形成空隙。此外,当使用暴露于空气中8.64×10〜5 s或更长时间的Cu板时,在相同退火条件下形成的反应产物层变得更薄。

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