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Phonon Confinement and Impurity Doping in Silicon Nanowires Synthesized by Laser Ablation

机译:激光烧蚀法合成硅纳米线的声子限制和杂质掺杂

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摘要

The effect of phonon confinement and impurity doping in silicon nanowires (SiNWs) synthesized by laser ablation were investigated. The diameter of SiNWs was controlled by the synthesis parameters during laser ablation and the subsequent thermal oxidation. Thermal oxidation increases the thickness of the SiNWs' surface oxide layer, resulting in a decrease in their crystalline Si core diameter. This effect causes a downshift and asymmetric broadening of the Si optical phonon peak due to phonon confinement. Boron doping was also performed during the growth of SiNWs. Local vibrational modes of boron (B) in silicon nanowires (SiNWs) synthesized by laser ablation were observed at about 618 and 640 cm"1 by Raman scattering measurements. Fano broadening due to coupling between discrete optical phonons and the continuum of interband hole excitations was also observed in the Si optical phonon peak. These results prove that B atoms were doped in the SiNWs.
机译:研究了声子限制和杂质掺杂对激光烧蚀合成的硅纳米线(SiNWs)的影响。 SiNW的直径由激光烧蚀和随后的热氧化过程中的合成参数控制。热氧化增加了SiNWs的表面氧化物层的厚度,导致其结晶Si核直径减小。由于声子限制,该效应导致Si光学声子峰的降档和不对称加宽。在SiNW的生长期间也进行了硼掺杂。通过拉曼散射测量,在约618和640 cm“ 1处观察到了激光烧蚀合成的硅纳米线(SiNWs)中硼(B)的局部振动模式。由于离散光子与带间空穴激发的连续性之间的耦合,导致了磁场展宽。这些结果证明,B原子被掺杂在SiNWs中。

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