Advanced Optical Metrology for Next-Generation Color Filter Processes and TFT-LCD Manufacturing

摘要

The requirements for improved visual display performance and increasing physical size have led to the development of advanced color filter designs. These advancements have resulted in tighter process requirements for dimensional and geometrical control of critical device features such as photo/post-spacers (PS) and domain alignment structures. The three-dimensional (x, y, and z) attributes of Photo Spacer (PS) and various domain alignment structures directly impact crucial display performance metrics, such as viewing angle and response time. In this paper, we will discuss an advanced, production-capable, optical-based metrology and inspection system. This system is designed to meet the manufacturing process challenges and requirements for the next-generation CF substrates.