Integrated Fast Atom beam (FAB) Processes for Fabricating Micro Diffractive Grating Structures and Micro Textured Surfaces

摘要

We developed four new fast atom beam (FAB) processing methods (I-IV) that produce (a) micro-pattern textured surfaces, (b) diffractive grating structures, or (c) functional nanostructures on three-dimensional (3D) microstructures. The first method (I) is for producing micro-pattern textured surfaces, and this combines FAB with micronsized particles (MP-FAB method). This method successfully etched 5 micron-diameter islands on silica glass. The second method (II) is aso for producing micro-pattern textured surfaces, and combines FAB with a separated mask (SM-FAB method). This method successfully etched a cross-mesh pattern (5 #mu#m wide lines that were 30 #mu#m apart) on a glass surface. The third method (III) is for producing diffractive grating structures, and combines FAB with a moving mask (MM-FAB method). This method successfully etched multiple triangular-wave structures on silica glass. The fourth method (IV) is for producing functional nanostructures on 3D microstructures, and combines FAB and electron-beam deposition patterns (ED-FAB method). This method successfully produced ultra-fine line structures (50 nm wide and 7.5 nm high) on two different surfaces of a 3D GaAs micro-workpiece. These results demonstrate the potential of integrating processing methods for producing integrated functional microsystems and nanostructures.