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Tapping Mode Capacitance Microscopy of a Nitride-Oxide-Silicon Recording Medium

机译:氮化物-氧化物-硅记录介质的拍击模式电容显微镜

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We have observed data bits recorded in a nitride-oxide-silicon (NOS) medium by the tapping mode capacitance microscopy. Tapping mode capacitance microscopy makes it possible to observe capacitance variations in the NOS medium with high sensitivity. The capacitive contrast and patterns of written bits are investigated. It is found that in some regions of the medium the capacitive contrast gets degraded due to unwanted depletion. A novel technique for improving the capacitive contrast is presented.
机译:我们已经通过分接模式电容显微镜观察到了记录在氮化硅(NOS)介质中的数据位。轻击模式电容显微镜使以高灵敏度观察NOS介质中的电容变化成为可能。研究了电容性对比度和写入位的模式。发现在介质的某些区域中,电容对比度由于不想要的消耗而降低。提出了一种改善电容对比度的新颖技术。

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