Debris free high brightness light source based on LPP for actinic EUV microscopy and metrology applications

摘要

We have presented experimental verification of concept's for LPP metrology sources with brightness potential of beyond 1000 W/(mm~2 sr) of EUV inband radiation bated on off-the-shelf and specially tested crucial components. We may opt for a Tin targe when it comes to similarity with the scanner source or Lithium when a spectral narrowband of EUV at 13.5 nm is required We are convinced that we are able to develop a source meeting spetific customer EUV technology demands in a short development timeline based on 1. Scientific expertise from theory then simulation to experimental knowledge 2. Specific demonstrated concepts and solutions for ctitical components 3. Experience with EUV metrology source R&D for more than 20 years 4. Experience with EUV sources and EUV tools in the field for more than 15 years 5. Engineering experience and power for developing, building, supplying and maintaining EUV Tools 6. Clean room production facilities and experienced personnel We offer to approach this task by coordinated step-by-step approach with our customers as risk minimizing for all partners.