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Correlations of Long-Term Reliability and Irregularly Electrodeposited Metal Surface Induced Corrosion on Module Tabs

机译:组件接线片上长期可靠性与不规则电沉积金属表面腐蚀的相关性

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One of the most common chemical failures to reduce long-term reliability of electronic devices is the corrosion. A particular factor causing it is the local heterogeneity either in metal or in electrolyte. In this study,we will discuss the extremely accelerated local attack that results in holes in electrodeposited Au/Ni/Cu substrates and electroless nickel immersion gold pads. The driving force for this local corrosion is roughly deposited metal surfaces which make the galvanic potential difference at the interface of Au and Ni. Although it is not easy to detect pits at the initial state of corrosion because of their small size,once the hole is formed the rate of metal erosion incredibly increases. In case of ENIG pads,we observed not only even large pores penetrating into the underlying Cu substrates but also the oxidized Ni depositing on the top Au layer,indicating that the Au/Ni/Cu layered structure was transformed to the NiO/Au/Cu structure through such pores. In order to accelerate ion assisted surface restructuring or surface breakdown ascribed to the heterogeneous electrodeposition and to measure the corrosion phenomena,we employed electrochemical approaches such as potential cycling and potential steps. Using scanning electron microscopy and optical microscopy,the modified surface structures could be revealed. We expect that this study will help the improved reliability in solder joints or wire bonding on ENIG pads and package substrates as well as give a clue for producing anticorrosive substrates. In respect to this,we suggest the potential pulse method in which the electrochemical potential goes toward negative and positive direction repeatedly to obtain a homogeneously electrodeposited substrate.
机译:腐蚀是降低电子设备长期可靠性的最常见化学故障之一。导致它的一个特殊因素是金属或电解质中的局部异质性。在这项研究中,我们将讨论极度加速的局部腐蚀,这种腐蚀会在电沉积的Au / Ni / Cu基底和化学镀镍浸金垫中产生孔。这种局部腐蚀的驱动力是粗略沉积的金属表面,这些表面在Au和Ni的界面处产生电势差。尽管由于尺寸小而不容易在腐蚀的初始状态下检测出凹坑,但一旦形成凹坑,金属腐蚀的速度就会大大增加。在使用ENIG焊盘的情况下,我们不仅观察到甚至大的孔都渗入下面的Cu基体中,而且还观察到了沉积在顶部Au层上的氧化Ni,这表明Au / Ni / Cu层状结构已转变为NiO / Au / Cu通过这些孔的结构。为了加速归因于异质电沉积的离子辅助表面重构或表面击穿并测量腐蚀现象,我们采用了电化学方法,例如电势循环和电势步骤。使用扫描电子显微镜和光学显微镜,可以揭示改性后的表面结构。我们希望这项研究将有助于提高ENIG焊盘和封装基板上的焊点或引线键合的可靠性,并为生产防腐蚀基板提供线索。鉴于此,我们建议采用电势脉冲方法,其中电化学电势反复向负和正方向移动以获得均匀电沉积的基板。

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