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Group-V doping impact on Cd-rich CdTe single crystals grown by traveling-heater method

机译:V族掺杂对行进加热器法生长的富CdCdTe单晶的影响

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Cd-rich CdTe single crystals were grown from Cd solvent in the traveling-heater method (THM) rather than the more common Te solvent used for high-resistivity CdTe. The growth process from Cd solution in terms of the solid-liquid interface shape and group-V doping under Cd-rich condition were investigated. Stable, flat solid-liquid interfaces can be obtained by optimizing THM furnace temperature profile. An apparent doping limit in the 10
机译:富镉的CdTe单晶是通过行进加热器方法(THM)从Cd溶剂中生长出来的,而不是从用于高电阻率CdTe的更常见的Te溶剂中生长的。从富液条件下固液界面形状和V族掺杂的角度研究了Cd溶液的生长过程。通过优化THM炉的温度曲线,可以获得稳定,平坦的固液界面。在10中的明显掺杂极限

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