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Homogeneity and variation of donor doping in Verneuil-grown SrTiO3:Nb single crystals

机译:Verneuil生长的SrTiO3:Nb单晶中施主掺杂的均质性和变化

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摘要

The homogeneity of Verneuil-grown SrTiO3:Nb crystals was investigated. Due to the fast crystal growth process, inhomogeneities in the donor dopant distribution and variation in the dislocation density are expected to occur. In fact, for some crystals optical studies show variations in the density of Ti3+ states on the microscale and a cluster-like surface conductivity was reported in tip-induced resistive switching studies. However, our investigations by TEM, EDX mapping, and 3D atom probe reveal that the Nb donors are distributed in a statistically random manner, indicating that there is clearly no inhomogeneity on the macro-, micro-, and nanoscale in high quality Verneuil-grown crystals. In consequence, the electronic transport in the bulk of donor-doped crystals is homogeneous and it is not significantly channelled by extended defects such as dislocations which justifies using this material, for example, as electronically conducting substrate for epitaxial oxide film growth.
机译:研究了Verneuil生长的SrTiO3:Nb晶体的均匀性。由于晶体的快速生长过程,预计会发生供体掺杂剂分布不均匀和位错密度变化。实际上,对于某些晶体,光学研究表明,Ti 3 + 态的密度在微观尺度上存在变化,并且在尖端诱导的电阻切换研究中报告了簇状表面电导率。但是,我们通过TEM,EDX映射和3D原子探针进行的研究表明,Nb供体以统计上随机的方式分布,这表明在高质量,Verneuil种植的大型,微型和纳米级上显然没有不均匀性晶体。结果,大部分供体掺杂的晶体中的电子传输是均匀的,并且不会被扩展的缺陷(例如位错)显着引导,这证明使用这种材料作为例如用于外延氧化膜生长的导电衬底是合理的。

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