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Reducing indirect programming mismatch due to oxide-traps using dual-channel floating-gate transistors

机译:减少使用双通道浮栅晶体管的氧化物陷阱引起的间接编程失配

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This paper presents a dual-channel architecture for floating-gate transistors that can alleviate the detrimental effects of oxide-traps seen in indirect programming techniques. The proposed transistor consists of four input/output ports that allow multiple paths for drain currents to flow and yet share the same gate-oxide and poly-silicon gate. As a result, one pair of the ports can be used for indirect programming, whereas the other pair can be actively connected to other analog circuits. Compared with the existing approaches for floating-gate programming, the proposed technique avoids disruption of the circuit operation and eliminates the effect of oxide-traps as well. In this paper we present measured results obtained from a dual-channel floating-gate current reference which has been fabricated in a 0.5-mum standard CMOS process.
机译:本文提出了一种用于浮栅晶体管的双通道架构,该架构可以减轻间接编程技术中出现的氧化物陷阱的不利影响。所提出的晶体管由四个输入/输出端口组成,这些端口允许多个路径使漏极电流流动,但共享相同的栅极氧化物和多晶硅栅极。结果,一对端口可以用于间接编程,而另一对端口可以主动连接到其他模拟电路。与现有的浮栅编程方法相比,所提出的技术避免了电路操作的中断,并且消除了氧化物陷阱的影响。在本文中,我们介绍了从采用0.5微米标准CMOS工艺制造的双通道浮栅电流基准获得的测量结果。

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