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Impacts of NBTI and PBTI on power-gated SRAM with high-k metal-gate devices

机译:NBTI和PBTI对具有高k金属栅极器件的功率门控SRAM的影响

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drifts degrade SRAM cell stability, margin and performance, and may lead to functional failure over the life of usage. Additionally, most state-of-the-art SRAMs are designed with power-gating structures to reduce leakage currents in Standby or Sleep mode, and the power switches suffer NBTI or PBTI stress/degradation as well. This paper presents a comprehensive analysis on the impacts of NBTI and PBTI on power-gated SRAM arrays with high-k metal-gate devices. NBTI/PBTI tolerant sense amplifier structures are also discussed.
机译:漂移会降低SRAM单元的稳定性,裕度和性能,并可能在整个使用寿命内导致功能故障。此外,大多数最新的SRAM均设计有电源门控结构,以减少待机或睡眠模式下的泄漏电流,并且电源开关也承受NBTI或PBTI应力/劣化。本文对NBTI和PBTI对具有高k金属栅极器件的功率门控SRAM阵列的影响进行了全面分析。还讨论了NBTI / PBTI耐受的读出放大器结构。

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