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The Improvement on Light Efficiency of Anti-Reflection Films by a DC Ion Source Sputter System in LCD Applications

机译:直流离子源溅射系统在LCD应用中提高抗反射膜的光效率

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In this paper, we use the DC reactive magnetic with ion source sputtering system to deposit the high packing density and smooth interface Anti-Reflection (AR) films at 80 °C. And we use the AR Coating on the B270 glass substrate to improve the visible range of lights transmittance average from 91.2% advanced to 95.2%. By using atomic force microscope (AFM) to identify the surface of the sputtered Nb2O5 films, we found that films’ roughness is 0.185nm.
机译:在本文中,我们使用带有离子源溅射系统的直流反应磁,在80°C的温度下沉积高堆积密度和光滑的界面抗反射(AR)膜。而且,我们在B270玻璃基板上使用增透膜,将可见光的平均透射范围从91.2%提高到95.2%。通过使用原子力显微镜(AFM)识别溅射的Nb2O5膜的表面,我们发现膜的粗糙度为0.185nm。

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