首页> 外文会议>Holography, Diffractive Optics, and Applications II pt.1 >Study on the Characteristics of Multilayer Dielectric Grating Mask Profile by the RCW Method
【24h】

Study on the Characteristics of Multilayer Dielectric Grating Mask Profile by the RCW Method

机译:RCW法研究多层介质光栅掩模的特性

获取原文
获取原文并翻译 | 示例

摘要

The fabrication of multilayer dielectric gratings was theoretically and experimentally investigated. The RCW (rigorous coupled-wave) method was adopted to theoretically analyze the influence, which is caused by the gratings profile and multilayer dielectric stack, on the diffraction efficiency. Researches on detecting principle and methods of the multilayer dielectric gratings were also tried to be carried out here. The spectral distributing of the zero order diffraction efficiency was used to judge the gratings profile, basing on the theoretical research and the calculating results by the RCW method. Detecting experiments have been conducted to compare the theoretical analyses; the results of this comparison may be helpful to instruct the detection of the gratings profile.
机译:在理论上和实验上研究了多层介质光栅的制造。理论上采用RCW(严格耦合波)方法分析了光栅轮廓和多层介质堆叠对衍射效率的影响。在此还试图对多层介质光栅的检测原理和方法进行研究。基于理论研究和RCW方法的计算结果,利用零级衍射效率的光谱分布来判断光栅轮廓。已经进行了检测实验以比较理论分析。比较的结果可能有助于指导检测光栅轮廓。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号