Department of Electrical and Computer Engineering, Virginia Commonwealth University, 601 West Main St, Richmond, VA USA 23284;
rnDepartment of Electrical and Computer Engineering, Virginia Commonwealth University, 601 West Main St, Richmond, VA USA 23284;
rnDepartment of Electrical and Computer Engineering, Virginia Commonwealth University, 601 West Main St, Richmond, VA USA 23284;
rnDepartment of Electrical and Computer Engineering, Virginia Commonwealth University, 601 West Main St, Richmond, VA USA 23284;
rnDepartment of Electrical and Computer Engineering, Virginia Commonwealth University, 601 West Main St, Richmond, VA USA 23284;
机译:晶格失配对高质量InAlN / AlN / GaN HFET结构中栅极滞后的影响
机译:(GaN)/ InAlN / GaN和InAlN / AlN / GaN HEMT中的栅极滞后效应和漏极滞后效应
机译:晶格匹配的InAlN / AlN / GaN异质结构中的快速热电子能量弛豫
机译:高质量的门滞后测量几乎晶格匹配Inaln / AlN / GaN HFET结构
机译:晶格匹配InxAl 1-xN与GaN的Vegard定律的验证以及用于深紫外LED的AlxGa1-xN / AlN的MOCVD生长
机译:使用MgGaδ掺杂降低纳米(AlN)5 /(GaN)1超晶格替代的Al0.83Ga0.17N无序合金中Mg受体的活化能:Mg局部结构效应
机译:晶格匹配的InalN / alN / GaN中的热电子能量弛豫 异质结构:电子 - 声子相互作用的总和规则 热声子效应
机译:用于干蚀刻GaN,alN,InGaN和InalN的等离子体化学物质