【24h】

Effect of Absorbed Hydrogen on Microstructure of Electrodeposited Cobalt

机译:氢吸收对电沉积钴微观结构的影响

获取原文
获取原文并翻译 | 示例

摘要

In electrodeposited cobalt film, the fcc cobalt phase, which is ordinarily recognized as a high temperature phase located over the 690 K region in the phase diagram, emerges at room temperature (1-7). Electrodeposited chromium films often assume hcp and/or fcc structure instead of ordinary bcc with an increasing the total amount of absorbed hydrogen (8-14). The structural changes in electrodeposited cobalt films are generally assumed to be influenced by absorbed hydrogen. However detecting the total amount of absorbed hydrogen in electrodeposited cobalt films was too difficult because the amount was much lower than the total amount of absorbed hydrogen in the electrodeposited chromium films (15-16). In this study, we established a quantitative analysis method of absorbed hydrogen in electrodeposited cobalt films by thermal desorption spectroscopy (TDS). This study elucidates the relationship between the total amount of absorbed hydrogen and the microstructure of the electrodeposited cobalt films.
机译:在电沉积钴膜中,通常在相图中被认为是位于690 K区域上方的高温相fcc钴相出现在室温下(1-7)。电沉积铬膜通常采用hcp和/或fcc结构,而不是普通的bcc结构,因此吸收的氢总量增加(8-14)。通常认为电沉积钴膜的结构变化受吸收氢的影响。但是,检测电沉积钴膜中的氢吸收总量太困难了,因为该量远低于电沉积铬膜中的氢吸收总量(15-16)。在这项研究中,我们建立了一种通过热解吸光谱法(TDS)对电沉积钴膜中吸收的氢进行定量分析的方法。这项研究阐明了氢的吸收总量与电沉积钴膜的微观结构之间的关系。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号