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Low-Frequency Noise in 'Graphene-Like' Exfoliated Thin Films of Topological Insulators

机译:拓扑绝缘体“类似石墨烯”的剥离薄膜中的低频噪声

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摘要

We report results of the study of the low-frequency noise in thin films of bismuth selenide topological insulators, which were mechanically exfoliated from bulk crystals via "graphene-like" procedures. From the resistance dependence on the film thickness, it was established that the surface conduction contributions to electron transport were dominant. It was found that the current fluctuations have the noise spectral density S_1∞ 1/f(where/is the frequency) for the frequency range up to 10 kHz. The obtained noise data are important for transport experiments with topological insulators and for any proposed device applications of these materials.
机译:我们报告了硒化铋拓扑绝缘体薄膜的低频噪声研究结果,该薄膜是通过“类石墨烯”程序从块状晶体中机械剥离的。从电阻对薄膜厚度的依赖性,可以确定表面传导对电子传输的贡献是主要的。发现在高达10 kHz的频率范围内,电流波动具有噪声频谱密度S_1∞1 / f(其中,/是频率)。获得的噪声数据对于使用拓扑绝缘子进行传输实验以及这些材料的任何拟议设备应用都是重要的。

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  • 来源
  • 会议地点 San Francisco CA(US);San Francisco CA(US)
  • 作者单位

    Nano-Device Laboratory, Department of Electrical Engineering and Materials Science and Engineering Program, University of California, Riverside, California 92521 USA;

    Department of Electrical, Computer and Systems Engineering and Center for Integrated Electronics, Rensselaer Polytechnic Institute, Troy, New York 12180 USA,Ioffe Institute, Russian Academy of Sciences, St. Petersburg, 194021 Russia;

    Nano-Device Laboratory, Department of Electrical Engineering and Materials Science and Engineering Program, University of California, Riverside, California 92521 USA;

    Nano-Device Laboratory, Department of Electrical Engineering and Materials Science and Engineering Program, University of California, Riverside, California 92521 USA;

    Department of Electrical, Computer and Systems Engineering and Center for Integrated Electronics, Rensselaer Polytechnic Institute, Troy, New York 12180 USA;

    Nano-Device Laboratory, Department of Electrical Engineering and Materials Science and Engineering Program, University of California, Riverside, California 92521 USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 半导体技术;
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