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Low-Frequency Noise in 'Graphene-Like' Exfoliated Thin Films of Topological Insulators

机译:“石墨烯”拓扑绝缘子剥落薄膜中的低频噪声

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We report results of the study of the low-frequency noise in thin films of bismuth selenide topological insulators, which were mechanically exfoliated from bulk crystals via "graphene-like" procedures. From the resistance dependence on the film thickness, it was established that the surface conduction contributions to electron transport were dominant. It was found that the current fluctuations have the noise spectral density S_1∞ 1/f(where/is the frequency) for the frequency range up to 10 kHz. The obtained noise data are important for transport experiments with topological insulators and for any proposed device applications of these materials.
机译:我们报告了溶质溶质晶体绝缘体的薄膜低频噪声研究的结果,通过“石墨烯”程序从散装晶体机械地剥离。从抵抗依赖膜厚度,建立了对电子传输的表面导电贡献是显性的。发现电流波动具有高达10kHz的频率范围的噪声光谱密度S_11∞1/ F(其中/是频率)。所获得的噪声数据对于用拓扑绝缘体和这些材料的任何提出的装置应用来运输实验很重要。

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