Multiplex IBAD/PACVD Technology

摘要

For creation of a sufficiently hard surface layer two conditions should be fulfilled. Hard coating should be deposited on the substrate, surface area of which is hardened to avoid breaking through the coating. The adhesion of the coating to the substrate should be also sufficient. For application high process productivity is desired. These demands can be simultaneously realized by multiplex high energy IBAD/PACVD technology. This technology is a combination of individual partial processes of high energy IBAD technology with the technology of PACVD. This new technology is described and proved in the paper by preparation of hard CN_x coatings on tool steel substrates. First partial technological process in this case is ion implantation of nitrogen (90 keV ion energy). By this process the hardening of surface area of the substrate takes place. Simultaneously, the last step of cleaning of substrate surface by ion sputtering for good coating adhesion proceeds. In the second partial process the evaporation of carbon is added to nitrogen ion implantation. The ion beam mixing causes the broad intermixed area at the substrate coating interface, which is very beneficial for adhesion of the coating. In the last technological process the deposition of coating is carried out by the PACVD method, which reaches high growth rate, so the desired coating thickness is obtained in a reasonable time.