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Effect of titanium interlayers on adhesion enhancement of platinum films on titanium oxide films and on temperature coefficient of resistivity of platinum films

机译:钛中间层对铂膜在氧化钛膜上的粘附增强以及对铂膜电阻率温度系数的影响

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摘要

The effect of insertion of a titanium (Ti) layer to enhance adhesion between platinum (Pt) and titanium oxide films has been investigated. Ti is known to be effective in enhancing adhesion, but it diffuses through the Pt films and oxidizes during heat-treatment in an oxygen atmosphere. Both diffusion and oxidation influence the temperature coefficient of resistivity (TCR) of the Pt films. High resolution electron microscopy revealed that the most of the Ti atoms in the titanium interlayer diffused through the grain boundaries of the Pt film and precipitated at the top surface grain boundaries of the film, while the rest of the Ti was oxidized inside the film. The optimum thickness of the adhesion-promoting Ti layer for enhancing adhesion and suppressing the decline of TCR was 10 nm.
机译:已经研究了插入钛(Ti)层以增强铂(Pt)和氧化钛膜之间的粘附力的效果。已知Ti可以有效地增强粘合性,但是它在Pt膜中扩散并在氧气气氛中进行热处理时被氧化。扩散和氧化都会影响Pt膜的电阻率温度系数(TCR)。高分辨率电子显微镜显示,钛中间层中的大多数Ti原子扩散通过Pt膜的晶界并沉淀在膜的顶表面晶界,而其余的Ti在膜内部被氧化。用于增强粘附力并抑制TCR下降的促进粘附力的Ti层的最佳厚度为10nm。

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