IMEC, Kapeldreef 75, Heverlee, Belgium B-3001;
IMEC, Kapeldreef 75, Heverlee, Belgium B-3001;
Inpria Corporation, 2001 NW Monroe Avenue, Corvallis, OR, USA 97330;
Inpria Corporation, 2001 NW Monroe Avenue, Corvallis, OR, USA 97330;
IMEC, Kapeldreef 75, Heverlee, Belgium B-3001;
IMEC, Kapeldreef 75, Heverlee, Belgium B-3001;
Inpria Corporation, 2001 NW Monroe Avenue, Corvallis, OR, USA 97330;
Inpria Corporation, 2001 NW Monroe Avenue, Corvallis, OR, USA 97330;
Inpria Corporation, 2001 NW Monroe Avenue, Corvallis, OR, USA 97330;
Inpria Corporation, 2001 NW Monroe Avenue, Corvallis, OR, USA 97330;
TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, NY 12203 U.S.A.;
Tokyo Electron Miyagi Limited, 1 Techno-Hills Taiwa-cho, Kurokawa-gun Miyagi 981-3629 Japan;
TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, NY 12203 U.S.A.;
EUV photoresist; metal oxide photoresist; pattemable hardmask; inorganic negative tone resist; N7 integration; process simplification;
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