National Research University of Informational Technologies, Mechanics and Optics, Saint-Petersburg, Russia,S.I. Vavilov State Optical Institute, Saint-Petersburg, Russia;
Ioffe Physical Technical Institute RAS, Saint-Petersburg, Russia;
National Research University of Informational Technologies, Mechanics and Optics, Saint-Petersburg, Russia;
National Research University of Informational Technologies, Mechanics and Optics, Saint-Petersburg, Russia;
National Research University of Informational Technologies, Mechanics and Optics, Saint-Petersburg, Russia;
National Research University of Informational Technologies, Mechanics and Optics, Saint-Petersburg, Russia;
National Research University of Informational Technologies, Mechanics and Optics, Saint-Petersburg, Russia,S.I. Vavilov State Optical Institute, Saint-Petersburg, Russia;
University of Eastern Finland, Kuopio, Finland;
productivity; wavefront aberration; High-NA lens; Vanguard; EUV projection lens; central obscuration; coaxial schemes;
机译:高NA EUV光刻中的波导效应:将EUV光刻扩展到4 nm节点的关键
机译:EUV光刻:高NA EUV光学器件正在发展中
机译:IMEC演示了具有高NA EUV干扰光刻的20nm间距线/空间抗蚀剂成像
机译:高NA EUV投影镜头,具有中央遮挡
机译:投影显像管液镜冷却系统的热设计评估。
机译:使用衍射可调镜头的高Na双光子单细胞成像远程聚焦
机译:高NA EUV波前计量的侧剪剪切干涉测量
机译:sEmaTECH High-Na光化学光罩检查项目(sHaRp)EUV面罩成像显微镜。