Development of soft x-ray multilayer mirrors for a wavelength of 3 nm

摘要

Abstract: Fabrication process of soft X-ray multilayer mirrors composed of Sc/Cr having shown high reflectances above 10% including the highest 14.8% for a wavelength of 3 nm is described. The multilayers were prepared by ion beam sputtering of an electron cyclotron resonance type enabling sputter deposition at the highest vacuum of 0.03m Torr. The multilayers were prepared at a stable deposition rate within 4 hours to suppress period instability and also at various substrate temperatures to find the best condition to suppress the interface roughness. !5