Nanoscale Fabrication in Aqueous KOH Solution by Atomic Force Microscope

摘要

Nanoscale fabrication of silicon substrate in aqueous solution based on the use of atomic force microscope was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of oxide layer easily by simple machining process with a given pitch, was applied in KOH solution instead of conventional silicon cantilever for measuring. The anisotropic wet etching stopped on modified area because of the corrosion resistance of silicon oxide against KOH. The fabrication of 3-dimensional nanostructure with a slope is possible by taking advantage of time lag of oxide formation during etching in KOH solution.