首页> 外文会议>European Photovoltaic Solar Energy Conference; 20060904-08; Dresden(DE) >EFFECT OF CRUCIBLE PURITY AND INTERFACE CHARACTERISTICS ON MULTICRYSTALLINE SILICON INGOT QUALITY
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EFFECT OF CRUCIBLE PURITY AND INTERFACE CHARACTERISTICS ON MULTICRYSTALLINE SILICON INGOT QUALITY

机译:坩埚纯度和界面特性对多晶硅质合金质量的影响

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摘要

Impurities diffusing from crucible/coating into the silicon during melting and crystallization degrade the silicon quality by reducing the minority carrier lifetime. This work was undertaken to test how the lifetime is affected by the purity of fused silica crucibles and silicon nitride used as coating. Also a crucible coated with high purity silica was tested to investigate if this layer functioned as a diffusion barrier by inhibiting impurities diffusing from the crucible into the melt/solidified silicon. It was found that reducing impurity content in the silicon nitride is important to achieve high minority carrier lifetime. A lifetime of 95 μs was measured on silicon from the high purity crucible coated with purified silicon nitride. The silica coated crucible showed a small improvement in minority carrier lifetime compared to the reference crucible, although the lifetime was considerably lower than for the high purity crucible. Investigation of the silica coating after the experiment revealed that the coating was not sufficiently thick. The high purity crucible showed different thermal behavior resulting in shorter melting time.
机译:在熔化和结晶过程中,杂质从坩埚/涂层扩散到硅中,会缩短少数载流子的寿命,从而降低硅的质量。进行这项工作是为了测试寿命如何受到熔融石英坩埚和用作涂层的氮化硅纯度的影响。还测试了涂覆有高纯度二氧化硅的坩埚,以研究该层是否通过抑制杂质从坩埚扩散到熔融/凝固的硅中而充当扩散阻挡层。已经发现,降低氮化硅中的杂质含量对于实现高的少数载流子寿命很重要。在来自涂有纯化氮化硅的高纯度坩埚上的硅上测得的寿命为95μs。与参考坩埚相比,涂有二氧化硅的坩埚在少数载流子寿命方面显示出很小的改善,尽管寿命大大低于高纯度坩埚。实验后对二氧化硅涂层的研究表明涂层不够厚。高纯度坩埚显示出不同的热行为,从而缩短了熔化时间。

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