STRUCTURAL, MECHANICAL AND OPTOELECTRONIC PROPERTIES OF AMORPHOUS CARBON FILMS DEPOSITED ON THE DIFFERENT ELECTRODES IN A PLASMA CVD SYSTEM

摘要

Amorphous carbon films with widely different properties were deposited on the powered and the grounded electrodes in a conventional plasma CVD system using 13.56 MHz rf plasma from methane - argon mixture. The analysis of the structural and the mechanical properties shows that the samples deposited on the cathode substrate (CS) are diamond like carbon (DLC) while those deposited on the grounded electrode substrates (GS) are closer to polymer like carbon (PLC). The most interesting observation was that the GS samples have very good UV photoresponse. In addition, the GS samples are also totally blind to the visible light. Hence these films could be excellent materials for UV detectors and UV enhanced photovoltaic devices.