首页> 外文会议>European Conference on Silicon Carbide and Related Materials(ECSCRM 2004); 20040831-0904; Bologna(IT) >Surface band structure studies of Si rich reconstructions on 4H-SiC(1100)
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Surface band structure studies of Si rich reconstructions on 4H-SiC(1100)

机译:4H-SiC(1100)上富硅重构物的表面能带结构研究

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摘要

We have investigated Si-rich reconstructions of 4H-SiC(1100) surfaces by means of low-energy electron diffraction (LEED), x-ray photoelectron spectroscopy (XPS), and angle-resolved ultraviolet photoelectron spectroscopy (ARUPS). The reconstructions of 4H-SiC(1100) were prepared by annealing the sample at different temperatures in a flux of Si. Depending on the temperature different reconstructions were observed: c(2x2) at T=800℃, c(2x4) at T=840℃. Both reconstructions show strong similarities in the electronic structure.
机译:我们已经通过低能电子衍射(LEED),X射线光电子能谱(XPS)和角分辨紫外光电子能谱(ARUPS)研究了4H-SiC(1100)表面的富硅重构物。 4H-SiC(1100)的重建物是通过在不同温度下在硅熔剂中对样品进行退火来制备的。根据温度,观察到不同的重构:在T = 800℃时c(2x2),在T = 840℃时c(2x4)。两种重建都在电子结构上显示出强烈的相似性。

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