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Microsystems Manufacturing via Embossing of Photodefinable Thermally Sacrificial Materials

机译:通过可光定义的热牺牲材料的压印进行微系统制造

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Substantial recent interest in microelectronics manufacturing has motivated significant work on non-traditional processes such as embossing-based lithography. This work has been generally limited to manufacturing conventional microelectronics, producing two dimensional patterned surfaces and structures. To date, little work has been done to produce microelectromechanical systems (MEMS), which can require production of complex three-dimensional and possibly free standing structures. This paper reports a novel method for manufacturing three-dimensional microstructures that can be freely standing and/or fully released. The method involves the use of thermally sacrificial polymers, i.e. materials that can be cleanly decomposed to gaseous products upon heating at elevated temperatures. Such sacrificial polymers can be directly embossed and subsequently overcoated with a variety of materials including other polymers, dielectrics, semiconductors, and metals. Following the deposition of the overcoat layer, further processing can be performed on the overcoat layer (e.g. selective etching or deposition of additional materials). Finally, the entire structure is heated to the decomposition temperature of the sacrificial polymer which results in the "dry" removal of the sacrificial layer, thus releasing the desired structures. The various sacrificial materials that have been investigated are polynorbornenes and polycarbonates, and the overlayer materials include polyimides, silicon oxide, and metals. This paper discusses the various properties of these sacrificial materials, the printing and processing conditions for these materials, and the use of this method for the fabrication of a MEMS based microfluidic system with free standing and suspended obstructions. This novel manufacturing technique meets the needs of MEMS manufacturing in that it can produce three dimensional and free standing microstructures. It permits the fabrication of devices and systems in only a few process steps that would otherwise be either substantially more complicated or impossible to achieve. This process of coating, embossing, and overcoating can also be repeated to build-up complex multi-layered structures.
机译:最近对微电子制造的极大兴趣促使人们在非传统工艺(例如基于压印的光刻)上进行了大量工作。这项工作通常仅限于制造常规的微电子学,产生二维图案化的表面和结构。迄今为止,生产微机电系统(MEMS)的工作很少,这可能需要生产复杂的三维结构并且可能需要独立的结构。本文报道了一种新颖的制造三维微结构的方法,该方法可以自由站立和/或完全释放。该方法包括使用热牺牲聚合物,即在高温下加热后可干净地分解为气态产物的材料。这种牺牲聚合物可以直接压花,然后再用包括其他聚合物,电介质,半导体和金属的各种材料进行覆盖。在沉积保护层之后,可以在保护层上进行进一步的处理(例如选择性蚀刻或沉积其他材料)。最后,将整个结构加热到牺牲聚合物的分解温度,这导致“干燥”去除牺牲层,从而释放出所需的结构。已研究的各种牺牲材料是聚降冰片烯和聚碳酸酯,覆盖层材料包括聚酰亚胺,氧化硅和金属。本文讨论了这些牺牲材料的各种特性,这些材料的印刷和加工条件,以及该方法在制造具有自由站立和悬浮障碍物的基于MEMS的微流体系统中的应用。这项新颖的制造技术可以产生三维和独立的微结构,从而满足了MEMS制造的需求。它仅允许在几个过程步骤中制造设备和系统,否则这些过程将实质上更加复杂或无法实现。涂覆,压花和外涂层的过程也可以重复进行,以建立复杂的多层结构。

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