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Structural, Optical and Electrical Properties of Cd_xZn_(1-x)Se Films

机译:Cd_xZn_(1-x)Se薄膜的结构,光学和电学性质

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Thin films of cadmium zinc selenide have been deposited at room temperature by the pulse plating technique using ZnSO_4, CdSO_4 and SeO_2 at room temperature and a deposition potential of - 0.9V. The duty cycle was varied in the range of 6 -50 %. X-ray diffraction studies indicate the formation of cubic structure. The band gap increases from 1.72eV for CdSe films to 2.70eV for ZnSe films as the concentration of ZnSe increases. AFM studies indicated that the average grain size increases from 30 nm to 125 nm with increasing concentration of Zn.The values of the resistivity decreases from 10000 ohm cm to 100 ohm cm for the films deposited at a duty cycle of 50 % as the concentration of CdSe increases.
机译:硒化镉锌薄膜已在室温下使用ZnSO_4,CdSO_4和SeO_2通过脉冲电镀技术在室温下沉积,沉积电位为-0.9V。占空比在6 -50%的范围内变化。 X射线衍射研究表明形成了立方结构。随着ZnSe的浓度增加,带隙从CdSe膜的1.72eV增加到ZnSe膜的2.70eV。 AFM研究表明,随着Zn浓度的增加,平均晶粒尺寸从30 nm增加到125 nm。对于浓度为50%的占空比,沉积的薄膜的电阻率值从10000 ohm cm减小到100 ohm cm。 CdSe增加。

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