COMPOSITE NITRIDED + Ti(N,C,O) TYPE LAYERS PRODUCED BY PAMOCVD PROCESSES

摘要

A prospective line in development of CVD processes is the PACVD method carried out under glow discharge conditions in a reactive atmosphere containing organic compounds as the source of metallic element that forms the surface layers in place of metal halides commonly used till now. The prospects of the further development lie also in the producing of composite layers by combining various treatments, such as e.g. plasma nitriding and PACVD technique. The combined properties, appropriately selected and complementary to one another, of the single component layers obtained using one of these processes permit widening the application range of these layers. The paper specifies the conditions under which composite surface layers nitrided + Ti(N,C,O) type from a mixture of tetraisoproxytitanium vapours, nitrogen and hydrogen can be produced. It also describes the influence of the process parameters on the structure, chemical composition and properties of the surface layers.