Preparation of low-k porous silica film incorporated with ethylene groups

摘要

We have demonstrated an Alkylen group incorporated porous silica film prepared by using hydrolysis and condensation of BIS(Triethoxysilyl)Ethelene (BTE). BTE and H_2O contained with HCl as a catalyst were mixture with organic solvent, 2-Methylpentane-2,4-diol (MPD). FT-IR peaks due to MPD were not observed but Si-C_2H_4-Si related peaks were still observed in the film even after 450℃ vacuum annealing. Electric characteristics were evaluated with an MOS structure. K value was not depended on the annealing temperature below 400℃, however, it was reduced down to 1.9 at 450℃.