首页> 外文会议>Eighth International Conference on Photorefractive Effects, Materials, and Devices, Jul 8-12, 2001, Delavan, Wisconsin >Bridgman growth and electric breakdown behavior of Vanadium-Zinc codoped Cadmium Telluride
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Bridgman growth and electric breakdown behavior of Vanadium-Zinc codoped Cadmium Telluride

机译:钒锌共掺杂碲化镉的布里奇曼生长和电击穿行为

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Photorefractive vanadium-zinc codoped Cadmium Telluride has been grown by the vertical Bridgman method under varied experimental conditions (with or without vertical magnetic field and with or without cadmium overpressure). Ingots with large single crystals, typically of the order of 1 cm~3, were obtained with a resistivity of about 10~(10) Ωcm. Infrared microscopy shows few tellurium secondary phases (precipitates and inclusions) when using cadmium overpressure. In this case residual absorption is low. The aim of our study was to investigate the electric breakdown behavior of vanadium-zinc codoped cadmium telluride under a 5-10 kV/cm electric field. Indeed such electric field allows to dramatically enhance the photorefractive response of the crystal. Induced electro-optic inhomogeneities inside our crystals were probed using a polarimetric method (with a collimated Nd:YAG laser beam -1.064 μm) coupled with a CCD camera which gives us the ability to have a global view of our sample and to accurately localize the breakdown. We mainly concentrate our attention on surface problems, on regions near contacts and on reproducibility of the latter.
机译:通过在不同的实验条件下(有或没有垂直磁场以及有或没有镉超压)通过垂直布里奇曼法生长了光折变钒锌共掺杂碲化镉。获得具有大的单晶的铸锭,通常具有约1cm 3至约10cm 3的电阻率。红外显微镜显示,当使用镉超压时,碲的次生相(沉淀和夹杂物)很少。在这种情况下,残留吸收低。我们的研究目的是研究在5-10 kV / cm电场下钒锌共掺杂碲化镉的电击穿行为。实际上,这种电场允许显着增强晶体的光折射响应。使用偏光法(使用准直的Nd:YAG激光束-1.064μm)和CCD摄像头探测晶体内部引起的电光不均匀性,这使我们能够对样品进行全局观察并精确定位分解。我们主要将注意力集中在表面问题,接触点附近的区域以及后者的可重复性上。

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