首页> 外文会议>Eighth International Conference on Photorefractive Effects, Materials, and Devices, Jul 8-12, 2001, Delavan, Wisconsin >Photorefractive multiple quantum well device at 1064 nm and its application to adaptive vibration measurement
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Photorefractive multiple quantum well device at 1064 nm and its application to adaptive vibration measurement

机译:1064 nm的光折变多量子阱器件及其在自适应振动测量中的应用

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摘要

We have fabricated photorefractive InGaAs/GaAs multiple quantum wells operating at a wavelength of 1064 nm and have characterized its photorefractive properties in the Franz-Keldysh geometry. A maximum gain coefficient of 200 cm~(-1) and a maximum four-wave mixing diffraction efficiency of 0.07% are obtained at an applied field of 15 kV/cm. Adaptive vibration measurement in a two-wave mixing configuration has also been demonstrated. The noise equivalent surface displacement of our measurement system is estimated at about 1.5Xl0~(-6) nm(W/Hz)~(1/2).
机译:我们已经制造了在1064 nm波长下工作的InGaAs / GaAs光折变多量子阱,并已在Franz-Keldysh几何形状中表征了其光折变特性。在15kV / cm的施加场下获得最大增益系数为200cm-1(-1),最大四波混合衍射效率为0.07%。还已经证明了两波混合配置中的自适应振动测量。我们的测量系统的等效噪声表面位移估计约为1.5X10〜(-6)nm(W / Hz)〜(1/2)。

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