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Analytical approximation for the evaluation of the effect of fabricationerror on the reflectivity of a Bragg mirror,

机译:用于评估制造误差对布拉格反射镜反射率的影响的分析近似法,

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摘要

Abstract: In this paper a novel analytical approach to evaluate spectral performances of non-ideal rectangular Bragg gratings, integrated in a slab waveguide is proposed. The effect of errors in the photolithographic definition of the grating, in particular in the period width, is investigated. We refer to gratings fabricated by means of standard e-beam photolithography apparatus. As a comparison, a numerical approach based on the Equivalent Multilayer Theory, combined with the Effective Index Method, is also presented. This procedure allow us to verify the theoretical limit of the analytical approach to better understand its range of applicability.!26
机译:摘要:本文提出了一种新的分析方法,用于评估集成在平板波导中的非理想矩形布拉格光栅的光谱性能。研究了光栅的光刻定义中的误差的影响,特别是周期宽度中的误差的影响。我们指的是通过标准电子束光刻设备制造的光栅。作为比较,还提出了一种基于等效多层理论并结合有效指数法的数值方法。该程序使我们能够验证分析方法的理论极限,以更好地了解其适用范围。26

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