首页> 外文会议>Device packaging 2010 >NO FLOW UNDERFILL PROCESS DEVELOPMENT FOR FINE PITCH FLIP CHIP SILICON TO SILICON WAFER LEVEL INTEGRATION
【24h】

NO FLOW UNDERFILL PROCESS DEVELOPMENT FOR FINE PITCH FLIP CHIP SILICON TO SILICON WAFER LEVEL INTEGRATION

机译:细间距倒装芯片硅到硅晶片级集成的无流量下溢工艺开发

获取原文
获取原文并翻译 | 示例

摘要

The industry has witnessed the adoption of flip chip for itsrnlow cost, small form factor, high performance and great I/Ornflexibility. As the Three Dimensional (3D) packagingrntechnology moves to the forefront, the flip chip to waferrnintegration, which is also a silicon to silicon assembly, isrngaining more and more popularity.rnNo flow underfill is of a special interest for the wafer levelrnflip chip assembly as it can dramatically reduce the processrntime as well as bring down the average package cost sincernthere is a reduction in the number of process steps and therndispenser and cure oven that would be necessary for thernstandard capillary underfill process.rnThis paper introduces the development of no flow underfillrnprocess for a sub-100 micron pitch flip chip to CSP waferrnlevel assembly. Challenges addressed include the no flowrnunderfill reflow profile study, underfill dispense amountrnstudy, chip floating control and the underfill voidingrnanalysis. Also different no flow underfill candidates arerninvestigated for the best performed processing material.
机译:业界已经见证了倒装芯片的低成本,小尺寸,高性能和出色的I / Ornflexibility。随着三维(3D)封装技术的发展,倒装芯片到晶圆的集成(同时也是硅到硅的装配)越来越受到人们的欢迎。对于晶圆级倒装芯片组件,没有任何流动性底部填充特别受关注。由于可以减少标准毛细管底部填充工艺所需的处理步骤和分配器和固化炉的数量,因此可以大大减少工艺时间并降低平均包装成本。本文介绍了无流式底部填充工艺的发展。小于100微米间距的倒装芯片到CSP晶圆级组件。应对的挑战包括无流量不足填充物回流曲线研究,不足填充物分配量研究,切屑漂浮控制和不足填充物空隙分析。还研究了不同的无流动性底部填充候选物,以获取最佳性能的处理材料。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号